With soaring energy costs and growing global green initiatives, the demand for energy-efficient solid-state lighting is exponentially increasing.

The electroluminescence from GaN based compound semiconductors has provided the foundation for a new lighting industry based on high brightness LEDs.

Plasma-Therm has been a supplier to the leading LED manufacturers for over 15 years. With expertise in etching gallium nitride (GaN), patterned sapphire substrates (PSS) and silicon carbide (SiC) as well as deposition of silicon oxide (SiO2) and nitride (SiNx), Plasma-Therm has the opportunity to partner with well-established industry leaders, as well as smaller pioneering companies.

The Plasma-Therm product line includes equipment for R&D through high volume production. Innovative solutions for single wafer and batch clamping provide cutting edge etch rate performance. In addition, long maintenance intervals are standard with a closed-loop temperature controlled source. Low maintenance contributes to a low cost-of-ownership for Plasma-Therm systems.

Typical Applications

  • Etch
    • GaN etch
    • SiC
    • PSS (patterned sapphire substrate)
    • AlGaInP (and related materials)
    • GaP
  • Deposition
    • SiNx PECVD stress controlled at high rates with excellent conformity
    • SiO2—High breakdown voltage, low stress, low temperature




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